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Journal of Micro/Nanolithography, MEMS, and MOEMS

Hybrid metrology: from the lab into the fab
Author(s): Alok Vaid; Alexander Elia; Givantha Iddawela; Cornel Bozdog; Matthew J. Sendelbach; Byungcheol Kang; Paul K. Isbester; Shay Wolfling
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Paper Abstract

The accelerated pace of the semiconductor industry in recent years is putting a strain on existing dimensional metrology equipment (such as critical dimension-secondary electron microscopy, atomic force microscopy, scatterometry) to keep up with ever-increasing metrology challenges. However, a revolution appears to be forming with the recent advent of hybrid metrology (HM). We highlight some of the challenges and lessons learned when setting up a standard HM solution and describe the first-in-industry implementation of HM within a high-volume manufacturing environment.

Paper Details

Date Published: 6 November 2014
PDF: 20 pages
J. Micro/Nanolith. 13(4) 041410 doi: 10.1117/1.JMM.13.4.041410
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 4
Show Author Affiliations
Alok Vaid, GLOBALFOUNDRIES Inc. (United States)
Alexander Elia, GLOBALFOUNDRIES Inc. (United States)
Givantha Iddawela, GLOBALFOUNDRIES Inc. (United States)
Cornel Bozdog, Nova Measuring Instruments Inc. (Israel)
Matthew J. Sendelbach, Nova Measuring Instruments Ltd. (Israel)
Byungcheol Kang, Nova Measuring Instruments, Ltd. (Israel)
Paul K. Isbester, Nova Measuring Instruments Inc. (Israel)
Shay Wolfling, Nova Measuring Instruments Ltd. (Israel)


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