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Journal of Micro/Nanolithography, MEMS, and MOEMS

Scatterometry performance enhancement by holistic approach
Author(s): Jie Li; Shahin Zangooie; Karthik Boinapally; Xi Zou; Jiangtao Hu; Zhuan Liu; Sanjay Yedur; Peter Wilkens; Avraham Ver; Robert Cohen; Babak Khamsehpour; Holger Schroder; John Piggot
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Paper Abstract

Scatterometry performance enhancement is demonstrated through a holistic approach by utilizing comprehensive information from various sources, including data from different process steps, different toolsets, multiple structures, and multiple optical channels using samples from magnetic hard disk drive manufacturing. Parameter and spectrum feed-forward are performed across multiple targets at the photo step and the photo results are fed forward to the post-reactive ion etch (RIE) step. For an isolated structure with critical dimensions (CD) much smaller than the incident light wavelengths, feed-forward methods improve CD correlation with a general improvement of 20 to 60% in precision and fleet measurement precision (FMP). A second technique examined is hybrid metrology, where inputs from source tools, such as CD-SEM and CD-AFM, are used to determine critical parameters. Hybridization of line edge roughness results in CD and sidewall angle (SWA) FMP improvement of ∼60%. We also demonstrate improved CD accuracy using azimuthal scatterometry at 0, 45, and 90 deg azimuth angles measuring resist lines with CD larger than the incident light wavelengths. FMP reductions of ∼60 and 30% are obtained for CD and SWA. SWA hybridization after RIE results in CD and SWA FMP improvements by > 50 and 30%, respectively.

Paper Details

Date Published: 16 October 2014
PDF: 12 pages
J. Micro/Nanolith. MEMS MOEMS 13(4) 041406 doi: 10.1117/1.JMM.13.4.041406
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 4
Show Author Affiliations
Jie Li, Nanometrics Inc. (United States)
Shahin Zangooie, HGST (United States)
Karthik Boinapally, Nanometrics Inc. (United States)
Xi Zou, Nanometrics Inc. (United States)
Jiangtao Hu, Nanometrics Inc. (United States)
Zhuan Liu, Nanometrics Inc. (United States)
Sanjay Yedur, Nanometrics Inc. (United States)
Peter Wilkens, HGST (United States)
Avraham Ver, HGST (United States)
Robert Cohen, HGST (United States)
Babak Khamsehpour, HGST (United States)
Holger Schroder, HGST (United States)
John Piggot, HGST (United States)

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