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Journal of Micro/Nanolithography, MEMS, and MOEMS

Pitch variations of self-assembled cylindrical block copolymers in lithographically defined trenches
Author(s): Henk Boots; Jessica M. de Ruiter; Thanh Trung Nguyen; Aurelie Brizard; Emiel Peeters; Sander F. Wuister; Tamara S. Druzhinina; Joanne K. Wolterink; Johannes G. E. M. Fraaije
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Paper Abstract

A detailed analysis of the impact of pitch variations in block copolymer self-assembly patterns on defect density and placement errors inside lithographically defined trenches is presented. The presence of random variations in the pitch of nanopatterns resulting from the self-assembly of cylindrical phase block copolymer in open trenches (one-dimensional confinement) is experimentally demonstrated and confirmed by theoretical modeling. The simulations show that the intrinsic pitch spread is not affected when the same block copolymer is studied inside closed trenches (two-dimensional confinement) where the observed spread has a direct influence on placement and defectivity. The magnitude of the detrimental impact of the pitch variations on both defect density and placement accuracy in closed trenches is strongly dependent on trench length. These findings pose new design rules for future applications of directed self-assembly in semiconductor industry.

Paper Details

Date Published: 15 September 2014
PDF: 10 pages
J. Micro/Nanolith. 13(3) 033015 doi: 10.1117/1.JMM.13.3.033015
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 3
Show Author Affiliations
Henk Boots, Philips Group Innovation (Netherlands)
Jessica M. de Ruiter, Philips Innovation Services (The Netherlands)
Thanh Trung Nguyen, Philips Group Innovation (Netherlands)
Aurelie Brizard, Philips Innovation Services (Germany)
Emiel Peeters, Philips Innovation Services (Netherlands)
Sander F. Wuister, ASML Netherlands B.V. (Netherlands)
Tamara S. Druzhinina, ASML Netherlands B.V. (Netherlands)
Joanne K. Wolterink, Culgi B.V. (Netherlands)
Johannes G. E. M. Fraaije, Culgi B.V. (Netherlands)
Leiden Univ. (Netherlands)


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