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Journal of Micro/Nanolithography, MEMS, and MOEMS

Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography
Author(s): Giuseppe Calafiore; Scott Dhuey; Simone Sassolini; Nerea Alayo; David Gosselin; Marko Vogler; Deidre L. Olynick; Christophe Peroz; Stefano Cabrini
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Paper Abstract

Numerous studies report the importance of nanoscale metallic features to increase the sensitivity of gas sensors, biodetectors, and for the fabrication of the new-generation plasmonic devices. So far, nanoimprint lithography has not shown the capability to pattern a metallic structure that would both be sub-15 nm and sufficiently thick to ensure electrical conductance. To overcome these limitations, we report a step and repeat nanoimprint lithography (SR-NIL) on a pre-spin-coated layer stack. This work reports the fabrication of sub-15-nm lines that are 15-nm thick and have a 50-nm-half-pitch grating with 35-nm-thick metal, which represents the new state of the art for SR-NIL.

Paper Details

Date Published: 5 September 2014
PDF: 4 pages
J. Micro/Nanolith. MEMS MOEMS 13(3) 033013 doi: 10.1117/1.JMM.13.3.033013
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 3
Show Author Affiliations
Giuseppe Calafiore, abeam Technologies, Inc. (United States)
Scott Dhuey, The Molecular Foundry (United States)
Simone Sassolini, The Molecular Foundry (United States)
Nerea Alayo, Univ. Autònoma de Barcelona (Spain)
David Gosselin, The Molecular Foundry (United States)
Marko Vogler, micro resist technology GmbH (Germany)
Deidre L. Olynick, The Molecular Foundry (United States)
Christophe Peroz, abeam Technologies, Inc. (United States)
Stefano Cabrini, The Molecular Foundry (United States)

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