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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fundamental study of placement errors in directed self-assembly
Author(s): Sander F. Wuister; Davide Ambesi; Tamara S. Druzhinina; Emiel Peeters; Jo Finders; Joanne K. Wolterink; Johannes G. Fraaije
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Paper Abstract

Contact holes (CHs) created by 193i lithography were shrunken by directed self-assembly of polystyrene-b-methylmethacrylate (PS-PMMA) block copolymers (BCPs). The placement error of these highly confined systems is determined both experimentally and by simulations. Good agreement between simulations (2 nm) and experiments was observed (2 nm). Extensive simulations show that the placement error is dependent on the length of the PS block only, indicating that the placement error is intrinsic to the BCP. This was explained by considering the BCPs as springs. For double CHs, a relation is found between the offset of the CH from the center of the CHs and the additional placement error.

Paper Details

Date Published: 25 July 2014
PDF: 9 pages
J. Micro/Nanolith. 13(3) 033005 doi: 10.1117/1.JMM.13.3.033005
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 3
Show Author Affiliations
Sander F. Wuister, ASML Netherlands B.V. (Netherlands)
Davide Ambesi, ASML Netherlands B.V. (Netherlands)
Tamara S. Druzhinina, ASML Netherlands B.V. (Netherlands)
Emiel Peeters, Koninklijke Philips Electronics N.V. (Netherlands)
Jo Finders, ASML Netherlands B.V. (Netherlands)
Joanne K. Wolterink, Culgi B.V. (Netherlands)
Johannes G. Fraaije, Culgi B.V. (Netherlands)
Leiden Univ. (Netherlands)

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