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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Optimization of directed self-assembly hole shrink process with simplified model
Author(s): Kenji Yoshimoto; Ken Fukawatase; Masahiro Ohshima; Yoshihiro Naka; Shimon Maeda; Satoshi Tanaka; Seiji Morita; Hisako Aoyama; Shoji Mimotogi

Paper Abstract

Application of the directed self-assembly of block copolymer to the hole shrink process has gained large attention because of the low cost and high potential for sublithographic patterning. In this study, we have employed a simplified model, called the Ohta-Kawasaki model to find the optimal process conditions, which minimize the morphological defects of the diblock copolymer, PS-b-PMMA. The model parameters were calibrated with cross-sectional transmission electron microscopy images. Our simulation results revealed that it is difficult to eliminate the morphological defects (i.e., PS residual layer) by only varying the shape of the guide hole. It turned out that changing the affinity of the bottom surface of the guide hole from “PMMA attractive” to “neutral” is a more effective way to obtain a reasonably wide, defect-free process window. Note that our simulations are not only computationally inexpensive, but are also comparable to the other detailed models such as the self-consistent field theory; they may also be feasible for large-scale simulations such as the hotspot analysis over a large area.

Paper Details

Date Published: 7 August 2014
PDF: 7 pages
J. Micro/Nanolith. 13(3) 031305 doi: 10.1117/1.JMM.13.3.031305
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 3
Show Author Affiliations
Kenji Yoshimoto, Kyoto Univ. (Japan)
Ken Fukawatase, Kyoto Univ. (Japan)
Masahiro Ohshima, Kyoto Univ. (Japan)
Yoshihiro Naka, Toshiba Corp. (Japan)
Shimon Maeda, Toshiba Corp. (Japan)
Satoshi Tanaka, Toshiba Corp. (Japan)
Seiji Morita, Toshiba Corp. (Japan)
Hisako Aoyama, Toshiba Corp. (Japan)
Shoji Mimotogi, Toshiba Corp. (Japan)


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