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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Special Section Guest Editorial: Alternative Lithographic Technologies

Paper Abstract

The SPIE Advanced Lithography Symposium is the most important and widely attended symposium on lithography today, typically attracting over 2000 attendees from more than 30 countries. For anyone working in the field and looking to understand the most current trends, the event constantly attracts the most groundbreaking work in the field and attracts the attention of the industry’s key decision makers.

Paper Details

Date Published: 3 October 2014
PDF: 2 pages
J. Micro/Nanolith. MEMS MOEMS 13(3) 031301 doi: 10.1117/1.JMM.13.3.031301
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 3
Show Author Affiliations
Douglas J. Resnick, Canon Nanotechnologies, Inc. (United States)
Christopher Bencher, Applied Materials, Inc. (United States)
Ricardo Ruiz, HGST (United States)

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