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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Photoluminescence-enhanced plasmonic substrates fabricated by nanoimprint lithography
Author(s): Bongseok Choi; Masanobu Iwanaga; Hideki T. Miyazaki; Kazuaki Sakoda; Yoshimasa Sugimoto

Paper Abstract

We fabricated large-area stacked complementary plasmonic crystals (SC PlCs) by employing ultraviolet nanoimprint lithography. The SC PlCs were made on silicon-on-insulator substrates consisting of three layers: the top layer contacting air was a perforated Au film, the bottom layer contacting the buried oxide layer included an Au disk array corresponding to the holes in the top layer, and the middle layer was a Si photonic crystal slab. The SC PlCs have prominent resonances in optical wavelengths. It is shown that the fabricated PlCs were precise in structure and uniform in their optical properties. We examined the photoluminescence (PL) enhancement of monolayer dye molecules on the SC PlC substrates in the visible range and found large PL enhancements of up to a 100-fold in comparison with dye molecules on nonprocessed Si wafers.

Paper Details

Date Published: 21 May 2014
PDF: 6 pages
J. Micro/Nanolith. 13(2) 023007 doi: 10.1117/1.JMM.13.2.023007
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 2
Show Author Affiliations
Bongseok Choi, National Institute for Materials Science (Japan)
Masanobu Iwanaga, National Institute for Materials Science (Japan)
Japan Science and Technology Agency (Japan)
Hideki T. Miyazaki, National Institute for Materials Science (Japan)
Kazuaki Sakoda, National Institute for Materials Science (Japan)
Tsukuba Univ. (Japan)
Yoshimasa Sugimoto, National Institute for Materials Science (Japan)


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