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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography
Author(s): Wen Lv; Edmund Y. Lam; Haiqing Wei; Shiyuan Liu

Paper Abstract

Robust inverse mask synthesis is computationally intensive, and its turnaround time continues to rise hand-in-hand with the ever-shrinking integrated circuit feature size. We report the development of a cascadic multigrid (CMG) algorithm for robust inverse mask synthesis, which starts from a relatively coarse mask grid and refines it iteratively in stages, so as to achieve significant speedup without compromising numerical accuracy. Since the CMG algorithm entails frequent changes of the computational grid size, we need to intentionally introduce an analytical circle-sampling technique for modeling the forward lithography imaging and employ an edge distance error as metric to guide mask synthesis. These two techniques work nicely with variable grid sizes and are well suited for our CMG algorithm. As a result, our algorithm achieves more than four times speedup over conventional methods that synthesize a mask on a fixed fine grid. Numerical results are presented to demonstrate the validity and efficiency of the proposed method.

Paper Details

Date Published: 28 April 2014
PDF: 10 pages
J. Micro/Nanolith. 13(2) 023003 doi: 10.1117/1.JMM.13.2.023003
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 2
Show Author Affiliations
Wen Lv, Huazhong Univ. of Science and Technology (China)
The Univ. of Hong Kong (Hong Kong)
Edmund Y. Lam, The Univ. of Hong Kong (Hong Kong, China)
Haiqing Wei, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)


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