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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Errata: Optimization of laser machining process for the preparation of photomasks, and its application to microsystems fabrication
Author(s): Avinash Kumar; Ankur Gupta; Rishi Kant; Akhhtar Syed Nadeem; Nachiketa Tiwari; Janakrajan Ramkumar; Shantanu Bhattacharya

Paper Abstract

This article [J. Micro/Nanolith. MEMS MOEMS. , 12, (4 ), 041203 (2013)] was originally published online on 25 September 2013 with errors in Figure 6. The figure sequence in the caption did not match the sequence given in the figure. Also, Fig. 6(d) showed an image of aluminum mask with a crossbar on the image which is not visible and an improper scale with a typographical error. The corrected figure and caption appear below. Online versions were corrected on 08 January 2014.

Paper Details

Date Published: 21 January 2014
PDF: 2 pages
J. Micro/Nanolith. 13(1) 019801 doi: 10.1117/1.JMM.13.1.019801
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 1
Show Author Affiliations
Avinash Kumar, Indian Institute of Technology Kanpur (India)
Ankur Gupta, Indian Institute of Technology Kanpur (India)
Rishi Kant, Indian Institute of Technology Kanpur (India)
Akhhtar Syed Nadeem, Indian Institute of Technology Kanpur (India)
Nachiketa Tiwari, Indian Institute of Technology Kanpur (India)
Janakrajan Ramkumar, Indian Institute of Technology Kanpur (India)
Shantanu Bhattacharya, Indian Institute of Technology Kanpur (India)


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