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Journal of Micro/Nanolithography, MEMS, and MOEMS

Diffusion-induced structural changes in La/B-based multilayers for 6.7-nm radiation
Author(s): Steven L. Nyabero; Robbert W. van de Kruijs; Andrey E. Yakshin; Igor A. Makhotkin; Jeroen Bosgra; Fred Bijkerk
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Paper Abstract

The thermal stability of La/B and LaN/B multilayers was investigated. The two multilayer systems were found to have comparable subångström period expansion upon annealing in the temperature range of 250°C to 400°C. For La/B multilayers, wide angle x-ray diffraction analysis revealed that the size of LaB 6 crystallites present did not change significantly upon thermal treatment. Using grazing incidence x-ray reflectometry, strong change in the internal structure due to interdiffusion at the interfaces of La/B multilayers was observed after annealing. This, coupled to the unchanged crystallinity, suggested the growth of amorphous lanthanum boride interlayers. At wavelength reflectance, measurements showed that as-deposited LaN/B multilayers had an enhanced optical contrast compared with La/B. During thermal loading, the rate of diffusion-induced reflectance decrease in LaN/B multilayers was slower than in La/B. The enhanced thermal stability of LaN/B was attributed to the slower growth of LaN-B interfaces compared with La-B.

Paper Details

Date Published: 17 March 2014
PDF: 6 pages
J. Micro/Nanolith. 13(1) 013014 doi: 10.1117/1.JMM.13.1.013014
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 13, Issue 1
Show Author Affiliations
Steven L. Nyabero, FOM Institute DIFFER (Netherlands)
Robbert W. van de Kruijs, FOM Institute DIFFER (Netherlands)
Andrey E. Yakshin, FOM Institute DIFFER (Netherlands)
Igor A. Makhotkin, FOM Institute DIFFER (Netherlands)
Jeroen Bosgra, FOM Institute DIFFER (Netherlands)
Fred Bijkerk, Univ. Twente (Netherlands)


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