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Journal of Micro/Nanolithography, MEMS, and MOEMS

Pattern transfer of directed self-assembly patterns for CMOS device applications
Author(s): Hsin-Yu Tsai; Hiroyuki Miyazoe; Sebastian U. Engelmann; Chi-Chun Liu; Lynne M. Gignac; James J. Bucchignano; David P. Klaus; Christopher M. Breslin; Eric A. Joseph; Joy Y. Cheng; Daniel P. Sanders; Michael A. Guillorn
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Paper Abstract

A study on the optimization of etch transfer processes using 200-mm-scale production type plasma etch tools for circuit relevant patterning in the sub-30-nm pitch regime using directed self-assembly (DSA) line–space patterning is presented. This work focuses on etch stack selection and process tuning, such as plasma power, chuck temperature, and end point strategy, to improve critical dimension control, pattern fidelity, and process window. Results from DSA patterning of gate structures featuring a high-k dielectric, a metal nitride and poly Si gate electrode, and a SiN capping layer are also presented. These results further establish the viability of DSA pattern generation as a potential method for Complementary metal–oxide–semiconductor (CMOS) integrated circuit patterning beyond the 10-nm node.

Paper Details

Date Published: 25 September 2013
PDF: 7 pages
J. Micro/Nanolith. 12(4) 041305 doi: 10.1117/1.JMM.12.4.041305
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 4
Show Author Affiliations
Hsin-Yu Tsai, IBM Thomas J. Watson Research Ctr. (United States)
Hiroyuki Miyazoe, IBM Thomas J. Watson Research Ctr. (United States)
Sebastian U. Engelmann, IBM Thomas J. Watson Research Ctr. (United States)
Chi-Chun Liu, IBM Corp. (United States)
Lynne M. Gignac, IBM Thomas J. Watson Research Ctr. (United States)
James J. Bucchignano, IBM Thomas J. Watson Research Ctr. (United States)
David P. Klaus, IBM Thomas J. Watson Research Ctr. (United States)
Christopher M. Breslin, IBM Thomas J. Watson Research Ctr. (United States)
Eric A. Joseph, IBM Thomas J. Watson Research Ctr. (United States)
Joy Y. Cheng, IBM Almaden Research Ctr. (United States)
Daniel P. Sanders, IBM Almaden Research Ctr. (United States)
Michael A. Guillorn, IBM Thomas J. Watson Research Ctr. (United States)


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