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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Nanoimprint lithography of deoxyribonucleic acid biopolymer films
Author(s): Emily M. Fehrman-Cory; Roberto S. Aga; Jack P. Lombardi; Carrie M. Bartsch; Andrew M. Sarangan; Emily M. Heckman

Paper Abstract

Thermal nanoimprint lithography (NIL) is presented as an alternative fabrication technique for patterning deoxyribonucleic acid (DNA) biopolymer films for photonic device applications. The techniques and procedures developed for directly imprinting optical waveguide structures on a DNA biopolymer using NIL, bypassing the use of a resist layer and any chemical processing, are outlined here. The fabrication technique was developed with a Nanonex NX-2600 NIL flexible membrane system. Additionally, a process for using a Suss MicroTec ELAN CB6L substrate bonder is discussed as an alternative to commercially available NIL systems.

Paper Details

Date Published: 16 December 2013
PDF: 3 pages
J. Micro/Nanolith. 12(4) 040501 doi: 10.1117/1.JMM.12.4.040501
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 4
Show Author Affiliations
Emily M. Fehrman-Cory, Univ. of Dayton (United States)
Roberto S. Aga, Air Force Research Lab. (United States)
Jack P. Lombardi, Air Force Institute of Technology (United States)
Carrie M. Bartsch, Air Force Research Lab. (United States)
Andrew M. Sarangan, Univ. of Dayton (United States)
Emily M. Heckman, Air Force Research Lab. (United States)


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