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Journal of Micro/Nanolithography, MEMS, and MOEMS

Datapath system for multiple electron beam lithography systems using image compression
Author(s): Jeehong Yang; Serap A. Savari; H. Rusty Harris
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Paper Abstract

The datapath throughput of electron beam lithography systems can be improved by applying lossless image compression to the layout images and using an electron beam writer that contains a decoding circuit packed in single silicon to decode the compressed image on-the-fly. In our past research, we had introduced Corner2, a lossless layout image compression algorithm that achieved significantly better performance in compression ratio, encoding/decoding speed, and decoder memory requirement than Block C4. However, it assumed a somewhat different writing strategy from those currently suggested by multiple electron beam (MEB) system designers. The Corner2 algorithm is modified so that it can support the writing strategy of an MEB system.

Paper Details

Date Published: 9 September 2013
PDF: 17 pages
J. Micro/Nanolith. MEMS MOEMS 12(3) 033018 doi: 10.1117/1.JMM.12.3.033018
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
Jeehong Yang, Qualcomm Inc. (United States)
Serap A. Savari, Texas A&M Univ. (United States)
H. Rusty Harris, Texas A&M Univ. (United States)

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