Share Email Print

Journal of Micro/Nanolithography, MEMS, and MOEMS

Framework for exploring the interaction between design rules and overlay control
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Overlay control is becoming increasingly more important with the scaling of technology. It has become even more critical and more challenging with the move toward multiple-patterning lithography, where overlay translates into CD variability. Design rules and overlay have strong interaction and can have a considerable impact on the design area, yield, and performance. We study this interaction and evaluate the overall design impact of rules, overlay characteristics, and overlay control options. For this purpose, we developed a model for yield loss from overlay that considers overlay residue after correction and the breakdown between field-to-field and within-field overlay; the model is then incorporated into a general design-rule evaluation framework to study the overlay/design interaction. The framework can be employed to optimize design rules and more accurately project overlay-control requirements of the manufacturing process. The framework is used to explore the design impact of litho-etch litho-etch double-patterning rules and poly line-end extension rule defined between poly and active layer for different overlay characteristics (i.e., within-field versus field-to-field overlay) and different overlay models at the 14-nm node. Interesting conclusions can be drawn from our results. For example, one result shows that increasing the minimum mask-overlap length by 1 nm would allow the use of a third-order wafer/sixth-order field-level overlay model instead of a sixth-order wafer/sixth-order field-level model with negligible impact on design.

Paper Details

Date Published: 19 August 2013
PDF: 11 pages
J. Micro/Nanolith. MEMS MOEMS 12(3) 033014 doi: 10.1117/1.JMM.12.3.033014
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
Rani S. Ghaida, GLOBALFOUNDRIES Inc. (United States)
Mukul Gupta, Univ. of California, Los Angeles (United States)
Puneet Gupta, Univ. of California, Los Angeles (United States)

© SPIE. Terms of Use
Back to Top