Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarimetry
Author(s): Xiuguo Chen; Shiyuan Liu; Chuanwei Zhang; Hao Jiang

Paper Abstract

Due to the rich information provided by the Mueller matrices when the most general conical diffraction configuration is considered, the Mueller matrix polarimetry has demonstrated a great potential in semiconductor manufacturing. As the configurations of the incidence and azimuthal angles have different influences on the measurement accuracy, it is necessary to select an optimal one among the multitude of possible options. We introduce the norm of a configuration error propagating matrix to assess the measurement accuracy for different measurement configurations. The optimal configuration for a Si grating sample was achieved by minimizing the norm of the configuration error propagating matrix. Experimental results show the agreement between the theoretically predicted optimal configuration and the experimental exhibited one obtained by using a dual-rotating compensator Mueller matrix polarimeter and thus demonstrated the validity of the proposed optimization method.

Paper Details

Date Published: 19 August 2013
PDF: 7 pages
J. Micro/Nanolith. 12(3) 033013 doi: 10.1117/1.JMM.12.3.033013
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
Xiuguo Chen, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)
Chuanwei Zhang, Huazhong Univ. of Science and Technology (China)
Hao Jiang, The Univ. of Texas at Arlington (United States)


© SPIE. Terms of Use
Back to Top