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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Periodic patterning using aerial image modulation with optical lithography
Author(s): Boyan Penkov; Garry J. Bordonaro; Andrii B. Golovin; Igor Bendoym; Donald M. Tennant; David T. Crouse

Paper Abstract

Photolithography for patterns with periodicity in the illumination plane (2.5-D lithography) has seen rapid advances over the past decade, with the introduction of holographic lithography and the further development of phase-contrast and grayscale photolithography methods. However, each of these techniques suffers from substantial difficulties preventing further integration into device fabrication: a lack of parallel processing capabilities and dimension limitations. Here, we present a demonstration of controlled layer topography through modulation of both the exposure dose and exposure focal plane yielding reproducible 2.5-D patterns which are applied to the further development of plasmonic gratings. This process is entirely compatible with commercially available i -line photolithography and etch hardware, enabling a path to ready integration.

Paper Details

Date Published: 2 August 2013
PDF: 5 pages
J. Micro/Nanolith. MEMS MOEMS 12(3) 033009 doi: 10.1117/1.JMM.12.3.033009
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
Boyan Penkov, Phoebus Optoelectronics, LLC (United States)
Garry J. Bordonaro, Cornell Univ. (United States)
Andrii B. Golovin, The City College of New York (United States)
Igor Bendoym, The City College of New York (United States)
Donald M. Tennant, Cornell Univ. (United States)
David T. Crouse, The City College of New York (United States)

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