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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Ecofriendly antiglare film derived from biomass using ultraviolet curing nanoimprint lithography for high-definition display
Author(s): Satoshi Takei; Gaku Murakami; Yuto Mori; Takumi Ichikawa; Atsushi Sekiguchi; Tsutomu Obata; Yoshiyuki Yokoyama; Wataru Mizuno; Junji Sumioka; Yuji Horita

Paper Abstract

Nanopatterning of an ecofriendly antiglare film derived from biomass using an ultraviolet curing nanoimprint lithography is reported. Developed sugar-related organic compounds with liquid glucose and trehalose derivatives derived from biomass produced high-quality imprint images of pillar patterns with a 230-nm diameter. Ecofriendly antiglare film with liquid glucose and trehalose derivatives derived from biomass was indicated to achieve the real refraction index of 1.45 to 1.53 at 350 to 800 nm, low imaginary refractive index of <0.005 and low volumetric shrinkage of 4.8% during ultraviolet irradiation. A distinctive bulky glucose structure in glucose and trehalose derivatives was considered to be effective for minimizing the volumetric shrinkage of resist film during ultraviolet irradiation, in addition to suitable optical properties for high-definition display.

Paper Details

Date Published: 29 August 2013
PDF: 8 pages
J. Micro/Nanolith. 12(3) 031113 doi: 10.1117/1.JMM.12.3.031113
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
Satoshi Takei, Toyama Prefectural Univ. (Japan)
Gaku Murakami
Yuto Mori
Takumi Ichikawa, Toyama Prefectural Univ. (Japan)
Atsushi Sekiguchi, Toyama Prefectural Univ. (Japan)
Tsutomu Obata
Yoshiyuki Yokoyama, Toyama Industrial Technology Ctr. (Japan)
Wataru Mizuno
Junji Sumioka
Yuji Horita


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