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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Directed self-assembly for high-density bit-patterned media fabrication using spherical block copolymers
Author(s): Shuaigang Xiao; XiaoMin Yang; Kim Y. Lee; Justin J. Hwu; Koichi Wago; David S. Kuo

Paper Abstract

Bit-patterned media (BPM) fabrication sets a high bar for nanopatterning especially in the aspects of lithography resolution and pattern transfer. Directed self-assembly (DSA) of spherical block copolymers (BCPs) provides promising pattern resolution extendibility and pattern layout flexibility as long as proper pre-pattern designs are provided. Polystyrene-block-polydimethylsiloxane in the form of monolayered spheres is used as a vehicle to form either globally densely packed nanodot arrays in the data zone or locally densely packed nanodot arrays in the servo zone on a BPM template. Skew compatibility of spherical BCPs is also discussed. The BCP dot template is then applied as the scaffold for pattern transfer into quartz to make a nanoimprint mold and further into magnetic storage media. Distributions of both dot sizes and dot spacings are closely monitored after DSA pattern formation and pattern transfer.

Paper Details

Date Published: 2 August 2013
PDF: 8 pages
J. Micro/Nanolith. 12(3) 031110 doi: 10.1117/1.JMM.12.3.031110
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
Shuaigang Xiao, Seagate Technology LLC (United States)
XiaoMin Yang, Seagate Technology LLC (United States)
Kim Y. Lee, Seagate Technology LLC (United States)
Justin J. Hwu, Seagate Technology LLC (United States)
Koichi Wago, Seagate Technology LLC (United States)
David S. Kuo, Seagate Technology LLC (United States)

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