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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography
Author(s): Luca Grella; Allen Carroll; Kirk Murray; Mark A. McCord; William M. Tong; Alan D. Brodie; Thomas Gubiotti; Fuge Sun; Francoise Kidwingira; Shinichi Kojima; Paul Petric; Christopher F. Bevis; Bart Vereecke; Luc Haspeslagh; Anil Mane; Jeffrey W. Elam

Paper Abstract

The digital pattern generator (DPG) is a complex electron-optical MEMS that pixelates the electron beam in the reflective electron beam lithography (REBL) e-beam column. It potentially enables massively parallel printing, which could make REBL competitive with optical lithography. The development of the REBL DPG, from the CMOS architecture, through the lenslet modeling and design, to the fabrication of the MEMS device, is described in detail. The imaging and printing results are also shown, which validate the pentode lenslet concept and the fabrication process.

Paper Details

Date Published: 5 August 2013
PDF: 12 pages
J. Micro/Nanolith. 12(3) 031107 doi: 10.1117/1.JMM.12.3.031107
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
Luca Grella, KLA-Tencor Corp. (United States)
Allen Carroll, KLA-Tencor Corp. (United States)
Kirk Murray, KLA-Tencor Corp. (United States)
Mark A. McCord, KLA-Tencor Corp. (United States)
William M. Tong, KLA-Tencor Corp. (United States)
Alan D. Brodie, KLA-Tencor Corp. (United States)
Thomas Gubiotti, KLA-Tencor Corp. (United States)
Fuge Sun, KLA-Tencor Corp. (United States)
Francoise Kidwingira, KLA-Tencor Corp. (United States)
Shinichi Kojima, KLA-Tencor Corp. (United States)
Paul Petric, KLA-Tencor Corp. (United States)
Christopher F. Bevis, KLA-Tencor Corp. (United States)
Bart Vereecke, IMEC (Belgium)
Luc Haspeslagh, IMEC (Belgium)
Anil Mane, Argonne National Lab. (United States)
Jeffrey W. Elam, Argonne National Lab. (United States)

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