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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

High-performance wire-grid polarizers using jet and Flash™ imprint lithography
Author(s): Se Hyun Ahn; Shuqiang Yang; Mike Miller; Maha Ganapathisubramanian; Marlon Menezes; Jin H. Choi; Frank Y. Xu; Douglas J. Resnick; S. V. Sreenivasan

Paper Abstract

Extremely large-area roll-to-roll (R2R) manufacturing on flexible substrates is ubiquitous for applications such as paper and plastic processing. It combines the benefits of high speed and inexpensive substrates to deliver a commodity product at low cost. The challenge is to extend this approach to the realm of nanopatterning and realize similar benefits. In order to achieve low-cost nanopatterning, it is imperative to move toward high-speed imprinting, less complex tools, near zero waste of consumables, and low-cost substrates. We have developed a roll-based J-FIL process and applied it to a technology demonstrator tool, the LithoFlex 100, to fabricate large-area flexible bilayer wire-grid polarizers (WGPs) and high-performance WGPs on rigid glass substrates. Extinction ratios of better than 10,000 are obtained for the glass-based WGPs. Two simulation packages are also employed to understand the effects of pitch, aluminum thickness, and pattern defectivity on the optical performance of the WGP devices. It is determined that the WGPs can be influenced by both clear and opaque defects in the gratings; however, the defect densities are relaxed relative to the requirements of a high-density semiconductor device.

Paper Details

Date Published: 12 August 2013
PDF: 10 pages
J. Micro/Nanolith. MEMS MOEMS 12(3) 031104 doi: 10.1117/1.JMM.12.3.031104
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
Se Hyun Ahn, Molecular Imprints, Inc. (United States)
Shuqiang Yang, Molecular Imprints, Inc. (United States)
Mike Miller, Molecular Imprints, Inc. (United States)
Maha Ganapathisubramanian, Molecular Imprints, Inc. (United States)
Marlon Menezes, Molecular Imprints, Inc. (United States)
Jin H. Choi, Molecular Imprints, Inc. (United States)
Frank Y. Xu, Molecular Imprints, Inc. (United States)
Douglas J. Resnick, Molecular Imprints, Inc. (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)

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