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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Special Section Guest Editorial: Alternative Lithographic Technologies

Paper Abstract

This year marks the second year of the Special Section on Alternative Lithographic Technologies. Our issue features papers on emerging lithographic technologies that are potentially both cost-effective and scalable to high-volume manufacturing (HVM).

Paper Details

Date Published: 30 September 2013
PDF: 2 pages
J. Micro/Nanolith. 12(3) 031101 doi: 10.1117/1.JMM.12.3.031101
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 3
Show Author Affiliations
William M. Tong, KLA-Tencor Corp. (United States)
Douglas J. Resnick, Molecular Imprints, Inc. (United States)
Ricardo Ruiz, HGST (United States)

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