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Journal of Micro/Nanolithography, MEMS, and MOEMS

Modeling the effects of pupil-manipulated spherical aberration in optical nanolithography
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Paper Abstract

An aerial image model is used to study the effects of spherical aberration applied in the lens pupil domain of a lithography projection scanner. These effects include the illumination dependency of focus exposure matrix tilt and the linear relationship between primary and higher order spherical coefficients on best focus (BF). Experimental data trends of BF through pitch and orientation have been replicated by an analytical expression. This computationally efficient formulation has the capability to provide corrective spherical aberration coefficients, which decrease the pitch-dependent BF and increase process latitude.

Paper Details

Date Published: 6 February 2013
PDF: 8 pages
J. Micro/Nanolith. 12(1) 013008 doi: 10.1117/1.JMM.12.1.013008
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 1
Show Author Affiliations
Monica Kempsell Sears, Rochester Institute of Technology (United States)
Bruce W. Smith, Rochester Institute of Technology (United States)


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