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Journal of Micro/Nanolithography, MEMS, and MOEMS

Applications of advanced metrology techniques for the characterization of extreme ultraviolet mask blank defects
Author(s): Jenah Harris-Jones; Emilio Stinzianni; Chihcheng Lin; Vibhu Jindal; Ranganath Teki; Hyuk Joo Kwon
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Paper Abstract

Characterization of defects and their sources is essential for developing mitigation solutions to support the production of defect-free extreme ultraviolet (EUV) mask blanks. The characterization of sub-100-nm defects pose challenges to the conventional metrology techniques, such as atomic force microscopy and scanning electron microscopy, limiting mitigation of nanoscale defects. SEMATECH’s Mask Blank Development Center houses advanced metrology capabilities that include transmission electron microscopy (TEM) and Auger electron spectroscopy (AES) to address these shortcomings. Scanning TEM was used to study the disruption of the Mo/Si multilayer of phase defects and to perform elemental analysis with energy dispersive x-ray spectroscopy that has supported projects including substrate smoothing activities, deposition simulation development, and defect printability studies. The Auger instrument was used to create elemental maps for defect identification and to characterize the ion beam deposition tool. Using advanced metrology, mitigation of small defects is being realized, yielding mask blanks with defect counts as low as eight defects at 50-nm sensitivity (Lasertec M7360 SiO2 sphere equivalent) measured over the quality area of 132×132 mm2 . The issues with the metrology of increasingly small EUV mask blank defects will be outlined, and comprehensive defect characterization results using TEM and AES will be presented.

Paper Details

Date Published: 6 February 2013
PDF: 7 pages
J. Micro/Nanolith. 12(1) 013007 doi: 10.1117/1.JMM.12.1.013007
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 12, Issue 1
Show Author Affiliations
Jenah Harris-Jones, SEMATECH North (United States)
Emilio Stinzianni, SEMATECH North (United States)
Chihcheng Lin, SEMATECH North (United States)
Vibhu Jindal, SEMATECH North (United States)
Ranganath Teki, SEMATECH North (United States)
Hyuk Joo Kwon, SEMATECH North (United States)

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