Share Email Print
cover

Journal of Micro/Nanolithography, MEMS, and MOEMS

Parametric constraints in multi-beam interference
Author(s): Guy Burrow; Thomas K. Gaylord
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Multi-beam interference (MBI) represents a method of producing one-, two-, and three-dimensional submicron periodic optical-intensity distributions for applications including micro- and nano-electronics, photonic crystals, metamaterial, biomedical structures, optical trapping, and numerous other subwavelength structures. Accordingly, numerous optical configurations have been developed to implement MBI. However, these configurations typically provide limited ability to condition the key parameters of each interfering beam. Constraints on individual beam amplitudes and polarizations are systematically considered to understand their effects on lithographically useful MBI periodic patterning possibilities. A method for analyzing parametric constraints is presented and used to compare the optimized optical-intensity distributions for representative constrained systems. Case studies are presented for both square and hexagonal-lattices produced via three-beam interference. Results demonstrate that constraints on individual-beam polarizations significantly impact patterning possibilities and must be included in the systematic design of an MBI system.

Paper Details

Date Published: 4 October 2012
PDF: 8 pages
J. Micro/Nanolith. 11(4) 043004 doi: 10.1117/1.JMM.11.4.043004
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 4
Show Author Affiliations
Guy Burrow, Georgia Institute of Technology (United States)
Thomas K. Gaylord, Georgia Institute of Technology (United States)


© SPIE. Terms of Use
Back to Top