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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet
Author(s): Igor A. Makhotkin; Erwin Zoethout; Eric Louis; Andrei M. Yakunin; Stephan Müllender; Fred Bijkerk

Paper Abstract

The spectral properties of LaN/B and LaN/B4C multilayer mirrors have been investigated in the 6.5 to 6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal reflectance for boron-based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN/B4C multilayer system is confirmed experimentally. Calculations of the wavelength-integrated reflectance for perfect ten-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.

Paper Details

Date Published: 19 October 2012
PDF: 3 pages
J. Micro/Nanolith. 11(4) 040501 doi: 10.1117/1.JMM.11.4.040501
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 4
Show Author Affiliations
Igor A. Makhotkin, FOM Institute DIFFER (Netherlands)
Erwin Zoethout, FOM Institute DIFFER (Netherlands)
Eric Louis, FOM Institute DIFFER (Netherlands)
Andrei M. Yakunin, ASML Netherlands B.V. (Netherlands)
Stephan Müllender, Carl Zeiss SMT GmbH (Germany)
Fred Bijkerk, FOM Institute DIFFER (Netherlands)

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