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Journal of Micro/Nanolithography, MEMS, and MOEMS

Cleaning induced imprint template erosion
Author(s): SherJang Singh; Zhaoning Yu; Nobuo Kurataka; Gene Gauzner; Hongying Wang; Henry H. Yang; Yautzong E. Hsu; Kim Y. Lee; David S. Kuo; Tobias Wähler; Peter Dress
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Paper Abstract

We studied the erosion and feature stability of fused silica patterns under different template cleaning conditions. The conventional sulfuric acid and hydrogen peroxide mixture (SPM) cleaning is compared with an advanced nonacid process. Spectroscopic ellipsometry optical critical dimension measurements were used to characterize the changes in pattern profile with good sensitivity. This study confirmed the erosion of the silica patterns in the traditional acid-based SPM cleaning mixture (H2SO4+H2O2) at a rate of ~ 0.1 nm per cleaning cycle. However, the advanced nonacid cleaning process only showed critical dimension shift of ~ 0.01 nm per cleaning. Contamination removal and pattern integrity of sensitive 20-nm features under MegaSonic assisted cleaning was also demonstrated.

Paper Details

Date Published: 13 September 2012
PDF: 5 pages
J. Micro/Nanolith. 11(3) 031407 doi: 10.1117/1.JMM.11.3.031407
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 3
Show Author Affiliations
SherJang Singh, SUSS MicroTec Inc. (United States)
Zhaoning Yu, Seagate Technology LLC (United States)
Nobuo Kurataka, Seagate Technology LLC (United States)
Gene Gauzner, Seagate Technology LLC (United States)
Hongying Wang, Seagate Technology LLC (United States)
Henry H. Yang, Seagate Technology LLC (United States)
Yautzong E. Hsu, Seagate Technology LLC (United States)
Kim Y. Lee, Seagate Technology LLC (United States)
David S. Kuo, Seagate Technology LLC (United States)
Tobias Wähler, HamaTech APE GmbH & Co. KG (Germany)
Peter Dress, SUSS MicroTec Photomask Equipment GmbH & Co. KG (Germany)


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