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Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography
Author(s): Lei Wan; Ricardo Ruiz; He H. Gao; Kanaiyalal C. Patel; Jeffery Lille; Gabriel Zeltzer; Elizabeth A. Dobisz; Alexei Bogdanov; Thomas R. Albrecht; Paul F. Nealey
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Paper Abstract

A block copolymer-directed self-assembly was combined with nanoimprint lithography to generate templates with rectangular patterns through an original double imprint process. A rotary e-beam tool was used to separately expose circumferential and radial line/space chemical contrast patterns with periodicities commensurate to the natural period of two lamellae-forming poly(styrene-b-methyl methacrylate) (PS-b-PMMA) block copolymers. Line patterns are formed by directed self-assembly of PS-b-PMMA on chemical patterns on two separate submaster templates, one with circumferential lines to define concentric tracks, and a second template on which the block copolymer is used to form radial lines at constant angular pitch. The patterns are subsequently transferred to their underlying Si substrates to form submaster templates. Using two sequential nanoimprinting steps, the radial and circumferential submaster line patterns were combined into a final quartz master template with rectangular bits on circular tracks.

Paper Details

Date Published: 7 August 2012
PDF: 6 pages
J. Micro/Nanolith. MEMS MOEMS 11(3) 031405 doi: 10.1117/1.JMM.11.3.031405
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 3
Show Author Affiliations
Lei Wan, HGST (United States)
Ricardo Ruiz, HGST (United States)
He H. Gao, HGST (United States)
Kanaiyalal C. Patel, HGST (United States)
Jeffery Lille, HGST (United States)
Gabriel Zeltzer, HGST (United States)
Elizabeth A. Dobisz, HGST (United States)
Alexei Bogdanov, HGST (United States)
Thomas R. Albrecht, HGST (United States)
Paul F. Nealey, Univ. of Wisconsin-Madison (United States)

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