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Journal of Micro/Nanolithography, MEMS, and MOEMS

50-keV electron multibeam mask writer for the 11-nm HP node: first results of the proof-of-concept electron multibeam mask exposure tool
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Paper Abstract

First results obtained with IMS Nanofabrication's 50-keV proof-of-concept electron multibeam mask exposure tool (eMET POC) are presented. The eMET POC was designed from scratch to meet the requirements of the 11-nm half-pitch node and already features the same column as future high volume manufacturing (HVM) tools. All exposures shown in this paper were the result of 262,144 beams of 20 nm beam size working in parallel demonstrating the capability of IMS's multibeam technology. An alpha tool is scheduled for 2014, followed by a beta tool in 2015 and first-generation HVM tools in 2016.

Paper Details

Date Published: 7 August 2012
PDF: 8 pages
J. Micro/Nanolith. 11(3) 031402 doi: 10.1117/1.JMM.11.3.031402
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 3
Show Author Affiliations
Christof Klein, IMS Nanofabrication AG (Austria)
Hans Loeschner, IMS Nanofabrication AG (Austria)
Elmar Platzgummer, IMS Nanofabrication AG (Austria)


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