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Journal of Micro/Nanolithography, MEMS, and MOEMS

Lithography assisted self-assembly of contact holes on 300-mm wafer scale
Author(s): Sander Wuister; Jo Finders; Emiel Peeters; Chris van Heesch
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Paper Abstract

Self-assembly of block copolymers is a potential technique to be used in the fabrication of microelectronic devices. In some cases, the self-assembly is directed by means of an additional technique, e.g. photolithography. This paper studies the impact of ArFi-lithography on the properties of the polymer after the directed assembly. Placement, critical dimension and critical dimension uniformity of the features are analyzed and discussed and compared to an integrated circuit application according to the international technology roadmap for semiconductors roadmap.

Paper Details

Date Published: 12 July 2012
PDF: 10 pages
J. Micro/Nanolith. 11(3) 031304 doi: 10.1117/1.JMM.11.3.031304
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 3
Show Author Affiliations
Sander Wuister, ASML Netherlands B.V. (Netherlands)
Jo Finders, ASML Netherlands B.V. (Netherlands)
Emiel Peeters, Philips Research Europe (Netherlands)
Chris van Heesch, Philips Research Nederland B.V. (Netherlands)


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