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Journal of Micro/Nanolithography, MEMS, and MOEMS

Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment
Author(s): Paulina A. Rincon Delgadillo; Christopher J. Thode; Paul F. Nealey; Roel Gronheid; Hengpeng Wu; Yi Cao; Mark Neisser; Mark H. Somervell; Kathleen Nafus
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Paper Abstract

The implementation of our previously reported chemo-epitaxy method for directed self-assembly (DSA) of block copolymers (BCPs) on 300-mm wafers is described in detail. Some challenges to be addressed include edge bead removal control of the layers forming the exposure stack and uniformity of the deposited films across the wafer. With the fine tuning of the process conditions, this flow provides chemically nanopatterned substrates with well-defined geometry and chemistry. After a film of BCP is annealed on the chemical patterns, high degrees of perfection are achieved. A BCP with natural periodicity of 25 nm was assembled on100-nm pitch prepatterns, obtaining 4X feature multiplication. Top-down scanning electron microscope images show a wide process window with depth of focus >200 nm and exposure latitude >40% for lines and spaces of 12.5-nm half-pitch. We provide a platform for future study of the origin of DSA generated defects and their relationship to process conditions and materials that are amenable to use by the semiconductor industry.

Paper Details

Date Published: 9 July 2012
PDF: 6 pages
J. Micro/Nanolith. MEMS MOEMS 11(3) 031302 doi: 10.1117/1.JMM.11.3.031302
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 3
Show Author Affiliations
Paulina A. Rincon Delgadillo, Univ. of Wisconsin-Madison (United States)
Christopher J. Thode, Univ. of Wisconsin-Madison (United States)
Paul F. Nealey, Univ. of Wisconsin-Madison (United States)
Roel Gronheid, IMEC (Belgium)
Hengpeng Wu, AZ Electronic Materials USA Corp. (United States)
Yi Cao, AZ Electronic Materials USA Corp. (United States)
Mark Neisser, AZ Electronic Materials (United States)
Mark H. Somervell, Tokyo Electron America, Inc. (United States)
Kathleen Nafus, Tokyo Electron America, Inc. (United States)

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