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Journal of Micro/Nanolithography, MEMS, and MOEMS • Open Access

Errata: Stochastic modeling in lithography: autocorrelation behavior of catalytic reaction-diffusion systems
Author(s): Chris A. Mack

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Paper Details

Date Published: 29 June 2012
PDF: 2 pages
J. Micro/Nanolith. 11(2) 029801 doi: 10.1117/1.JMM.11.2.029801
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 2
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