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Journal of Micro/Nanolithography, MEMS, and MOEMS

Potential of the FLASH free electron laser technology for the construction of a kW-scale light source for next-generation lithography
Author(s): Evgeny A. Schneidmiller; Vladimir F. Vogel; Hans Weise; Mikhail V. Yurkov
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Paper Abstract

The driving engine of the free electron laser in Hamburg (FLASH) is an L-band superconducting accelerator. It is designed to operate in burst mode with an 800-ms pulse duration at a repetition rate of 10 Hz. The maximum accelerated beam current during the macropulse is 9 mA. Our analysis shows that the FLASH technology has great potential since it is possible to construct a FLASH-like free electron laser operating at the wavelength of 13.5 and 6.8 nm with an average power of up to 2.6 kW. Such a source meets the physical requirements for the light source for next-generation lithography.

Paper Details

Date Published: 29 May 2012
PDF: 10 pages
J. Micro/Nanolith. 11(2) 021122 doi: 10.1117/1.JMM.11.2.021122
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 2
Show Author Affiliations
Evgeny A. Schneidmiller, Deutsches Elektronen-Synchrotron (Germany)
Vladimir F. Vogel, Deutsches Elektronen-Synchrotron (Germany)
Hans Weise, Deutsches Elektronen-Synchrotron (Germany)
Mikhail V. Yurkov, Deutsches Elektronen-Synchrotron (Germany)


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