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Journal of Micro/Nanolithography, MEMS, and MOEMS

Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source
Author(s): Hironari Yamada; Dorian Minkov; Taichi Hayashi; Daisuke Hasegawa
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Paper Abstract

Advances of tabletop electron storage rings for generating a brilliant extreme ultraviolet (EUV) or soft x-ray beam are discussed. An electron storage ring called MIRRORCLE-20SX currently provides a stored beam current with an average of 3 A, a 1-minute lifetime, 15 ms radiation damping time, and a beam size of about 3×3 mm2. We generate EUV by a thin-film target placed in the electron orbit. Photons in the wavelength around 13.9 nm is generated by an Si thin film, and 4.3 nm by a diamond-like carbon (DLC) film placed in the circulating electron beam. It is known from previous experimental studies that the mechanism of EUV emission is a synchrotron Cherenkov radiation (SCR). The observed photon power is 14 W/sr by the DLC film. We report that SCR is suitable for EUV lithography (EUVL) because the spectrum is monochromatic, the radiation angular spread is as narrow as 20×5 mrad2, and the emitter size can be 0.01×3 mm2. An optimized EUV source for lithography based on the tabletop synchrotron is proposed.

Paper Details

Date Published: 29 May 2012
PDF: 6 pages
J. Micro/Nanolith. 11(2) 021121 doi: 10.1117/1.JMM.11.2.021121
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 2
Show Author Affiliations
Hironari Yamada, Photon Production Co. Ltd. (Japan)
Dorian Minkov, Photon Production Co. Ltd. (Japan)
Taichi Hayashi, Photon Production Co. Ltd. (Japan)
Daisuke Hasegawa, Photon Production Co. Ltd. (Japan)


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