Share Email Print

Journal of Micro/Nanolithography, MEMS, and MOEMS

Development of stable extreme-ultraviolet sources for use in lithography exposure systems
Format Member Price Non-Member Price
PDF $20.00 $25.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Laser-produced plasma sources offer the best option for scalability to support high-throughput lithography. Challenges associated with the complexity of such a source are being addressed in a pilot program where sources have been built and integrated with extreme-ultraviolet (EUV) scanners. Up to now, five pilot sources have been installed at R&D facilities of chip manufacturers. Two pilot sources are dedicated to product development at our facility, where good dose stability has been demonstrated up to levels of 32 W of average EUV power. Experimental tests on a separate experimental system using a laser prepulse to optimize the plasma conditions or EUV conversion show power levels equivalent to approximately 160 W within a low duty-cycle burst, before dose control is applied. The overall stability of the source relies on the generation of Sn droplet targets and large EUV collector mirrors. Stability of the Sn droplet stream is well below 1 μm root mean square during 100+  h of testing. The lifetime of the collector is significantly enhanced with improved coatings, supporting uninterrupted operation for several weeks.

Paper Details

Date Published: 29 June 2012
PDF: 9 pages
J. Micro/Nanolith. 11(2) 021110 doi: 10.1117/1.JMM.11.2.021110
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 2
Show Author Affiliations
Igor V. Fomenkov, Cymer, Inc. (United States)
Bruno La Fontaine, Cymer, Inc. (United States)
Daniel J. Brown, Cymer, Inc. (United States)
Imtiaz Ahmad, Cymer, Inc. (United States)
Peter Baumgart, Cymer, Inc. (United States)
Norbert R. Bowering, Cymer, Inc. (United States)
David C. Brandt, Cymer, Inc. (United States)
Alexander N. Bykanov, Cymer, Inc. (United States)
Silvia De Dea, Cymer, Inc. (United States)
Alex I. Ershov, Cymer, Inc. (United States)
Nigel R. Farrar, Cymer, Inc. (United States)
Daniel J. Golich, Cymer, Inc. (United States)
Michael J. Lercel, Cymer, Inc. (United States)
David W. Myers, Cymer, Inc. (United States)
Chirag Rajyaguru, Cymer, Inc. (United States)
Shailendra Srivastava, Cymer, Inc. (United States)
Yezheng Tao, Cymer, Inc. (United States)
Georgiy O. Vaschenko, Cymer, Inc. (United States)

© SPIE. Terms of Use
Back to Top