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Journal of Micro/Nanolithography, MEMS, and MOEMS

Extreme-ultraviolet light source development to enable pre-production mask inspection
Author(s): Matthew Partlow; Matthew Besen; Paul Blackborow; Ron Collins; Deborah Gustafson; Stephen Horne; Donald Smith
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Paper Abstract

As extreme-ultraviolet (EUV) lithography moves into pre-production, the requirement for commercially available mask metrology tools becomes more urgent. A key to developing a successful tool is a reliable, high-brightness EUV light source. The Energetiq EQ-10 is a commercially available EUV light source, with an installed base of over 15 sources in the field. The source relies on an electrodeless Z-pinch™ to produce greater than 10 Watts/2Π of 13.5 nm 2% bandwidth light. In order to meet brightness and stability requirements of mask metrology tools, we have investigated modifications to the original design of the EQ-10. The result of these modifications has roughly doubled the source output power, and has achieved brightness greater than 8 Watts/mm2/sr, without sacrificing the spatial and pulse-to-pulse stability of the original design. This level of performance is sufficient for initial mask blank and imaging inspection tools.

Paper Details

Date Published: 21 May 2012
PDF: 11 pages
J. Micro/Nanolith. 11(2) 021105 doi: 10.1117/1.JMM.11.2.021105
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 2
Show Author Affiliations
Matthew Partlow, Energetiq Technology, Inc. (United States)
Matthew Besen, Energetiq Technology, Inc. (United States)
Paul Blackborow, Energetiq Technology, Inc. (United States)
Ron Collins, Energetiq Technology, Inc. (United States)
Deborah Gustafson, Energetiq Technology, Inc. (United States)
Stephen Horne, Energetiq Technology, Inc. (United States)
Donald Smith, Energetiq Technology, Inc. (United States)


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