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Journal of Micro/Nanolithography, MEMS, and MOEMS

Combining micro- and nano-texture to fabricate an antireflective layer
Author(s): Mohammad Malekmohammad; Mohammad Soltanolkotabi; Mohammad H. Naderi; Reza Asadi; Alireza Erfanian; M. Zahedinejad; Mahdi Khaje; Shahin Bagheri
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Paper Abstract

We combined photonic crystal (PC) and nanoporous structures in silicon (Si) to decrease the reflectance of the Si surface. Due to gradual increase of effective refractive index in this structure, reflection is reduced drastically over a broad spectral range. A two-dimensional Si PC was fabricated by interference lithography, then a nanoporous structure was made on the PC by using metal-assisted chemical etching. The obtained reflectance is about 3% across a spectral range of 400 to 2000 nm. This indicates an improvement of reflectance up to 90% compared to bare Si.

Paper Details

Date Published: 21 March 2012
PDF: 6 pages
J. Micro/Nanolith. 11(1) 013011 doi: 10.1117/1.JMM.11.1.013011
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 1
Show Author Affiliations
Mohammad Malekmohammad, Univ. of Isfahan (Iran, Islamic Republic of)
Mohammad Soltanolkotabi, Univ. of Isfahan (Iran, Islamic Republic of)
Mohammad H. Naderi, Univ. of Isfahan (Iran, Islamic Republic of)
Reza Asadi, Univ. of Tehran (Iran, Islamic Republic of)
Alireza Erfanian, K.N. Toosi Univ. of Technology (Iran, Islamic Republic of)
M. Zahedinejad, K.N. Toosi Univ. of Technology (Iran, Islamic Republic of)
Mahdi Khaje, K.N. Toosi Univ. of Technology (Iran, Islamic Republic of)
Shahin Bagheri, Shahid Beheshti Univ. (Iran, Islamic Republic of)


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