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Journal of Micro/Nanolithography, MEMS, and MOEMS

Atomic force microscope method for sidewall measurement through carbon nanotube probe deformation correction
Author(s): Masahiro Watanabe; Shuichi Baba; Toshihiko Nakata; Takafumi Morimoto; Satoshi Sekino; Hiroshi Itoh
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Paper Abstract

To use atomic force microscope to measure narrow vertical features is challenging. Using carbon nanotube (CNT) probes is a possible remedy. However, even with its extremely high stiffness, van der Waals attractive force from steep sidewalls bends CNT probes. This probe deflection effect causes deformation (or "swelling") of the measured profile. When measuring 100-nm-high vertical sidewalls with a 27-nm-diameter and 265-nm-long CNT probe, the probe deflection at the bottom is estimated as large as 5.8 nm. This phenomenon is inevitable when using long and thin probes. We proposed a method to correct this probe deflection effect. Detecting torsional motion of the base cantilever of the CNT probe makes it possible to estimate the CNT probe deflection. Using this information, we have developed a technique for correcting the probe deformation effect from measured profiles. This technique, in combination with correction of the probe shape effect, enables vertical sidewall profile measurement with AFM.

Paper Details

Date Published: 12 March 2012
PDF: 13 pages
J. Micro/Nanolith. 11(1) 011009 doi: 10.1117/1.JMM.11.1.011009
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 1
Show Author Affiliations
Masahiro Watanabe, Hitachi, Ltd. (Japan)
Shuichi Baba, Hitachi, Ltd. (Japan)
Toshihiko Nakata, Hitachi, Ltd. (Japan)
Takafumi Morimoto, Hitachi Construction Machinery Co., Ltd. (Japan)
Satoshi Sekino, Hitachi Construction Machinery Co., Ltd. (Japan)
Hiroshi Itoh, National Institute of Advanced Industrial Science and Technology (Japan)


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