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Journal of Micro/Nanolithography, MEMS, and MOEMS

A Change of the Guard
Author(s): Chris A. Mack
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Paper Abstract

In 1985, I presented my first paper—at an SPIE conference on lithography. It was the perfect venue for my work—a topical meeting full of people with the same interests as me, eager to communicate their latest results. That remains the paradigm for SPIE conferences to this day. But after publishing a few papers in conference proceedings, I decided that I had some work that deserved a peer-reviewed publication. But unlike the SPIE conferences that were the perfect fit for the work I did, there was no journal that matched the topic. Over the next 15 years I published papers in a number of journals: Optical Engineering, Applied Optics, Journal of the Electrochemical Society, Journal of Vacuum Science and Technology, IEEE Transactions on Semiconductor Manufacturing, Japanese Journal of Applied Physics, and others. Every time, I felt like an orphan. My lithography papers were surrounded by good papers that I had no interest in—and I’m sure that most readers of those journals felt the same way about my papers. Lithography had no peer-reviewed home.

Paper Details

Date Published: 6 April 2012
PDF: 28 pages
J. Micro/Nanolith. 11(1) 010101 doi: 10.1117/1.JMM.11.1.010101
Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS Volume 11, Issue 1
Show Author Affiliations
Chris A. Mack, SEMATECH Inc. (United States)


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