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Journal of Electronic Imaging • Open Access

Resolution and sensitivity of wafer-level multi-aperture cameras
Author(s): Alexander Oberdörster; Hendrik P. A. Lensch

Paper Abstract

The scaling limits of multi-aperture systems have been widely discussed from an information-theoretical standpoint. While these arguments are valid as an upper limit, the real-world performance of systems for mobile devices remains restricted by optical aberrations. We argue that aberrations can be more easily controlled with certain architectures of multi-aperture systems, especially those manufactured on wafer scale (wafer-level optics, WLO). We complement our analysis with measurements of one single- and one multi-aperture WLO camera. We examine both sharpness and sensitivity, giving measurements of modulation transfer function and temporal noise, and showing that multi-aperture systems can indeed reduce size without compromising performance.

Paper Details

Date Published: 31 January 2013
PDF: 10 pages
J. Electron. Imag. 22(1) 011001 doi: 10.1117/1.JEI.22.1.011001
Published in: Journal of Electronic Imaging Volume 22, Issue 1
Show Author Affiliations
Alexander Oberdörster, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Hendrik P. A. Lensch, Univ. Ulm (Germany)

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