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Journal of Astronomical Telescopes, Instruments, and Systems

Performance and prospects of far ultraviolet aluminum mirrors protected by atomic layer deposition
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Paper Abstract

Metallic aluminum mirrors remain the best choice for high reflectance applications at ultraviolet wavelengths (90 to 320 nm) and maintain good performance through optical and infrared wavelengths. Transparent protective coatings are required to prevent the formation of an oxide layer, which severely degrades reflectance at wavelengths below 250 nm. We report on the development of atomic layer deposition (ALD) processes for thin protective films of aluminum fluoride that are viable for application at substrate temperatures <200°C. Reflectance measurements of aluminum films evaporated in ultrahigh vacuum conditions, and protected mirrors encapsulated with ALD AlF3 are used to evaluate the far ultraviolet (90 to 190 nm) and near ultraviolet (190 to 320 nm) performance of both the ALD material and the underlying metal. Optical modeling is used to predict the performance of optimized structures for future astronomical mirror applications.

Paper Details

Date Published: 7 June 2016
PDF: 9 pages
J. Ast. Inst. Sys. 2(4) 041206 doi: 10.1117/1.JATIS.2.4.041206
Published in: Journal of Astronomical Telescopes, Instruments, and Systems Volume 2, Issue 4
Show Author Affiliations
John J. Hennessy, Jet Propulsion Lab. (United States)
Kunjithapatham Balasubramanian, Jet Propulsion Lab. (United States)
Christopher S. Moore, Univ. of Colorado Boulder (United States)
April D. Jewell, Jet Propulsion Lab. (United States)
Shouleh Nikzad, Jet Propulsion Lab. (United States)
Kevin C. France, Univ. of Colorado Boulder (United States)
Manuel A. Quijada, NASA Goddard Space Flight Ctr. (United States)


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