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Optical Engineering

Stress, reflectance, and temporal stability of sputter-deposited Mo/Si and Mo/Be multilayer films for extreme ultraviolet lithography
Author(s): Paul B. Mirkarimi
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Paper Details

Date Published: 1 July 1999
PDF: 14 pages
Opt. Eng. 38(7) doi: 10.1117/1.602170
Published in: Optical Engineering Volume 38, Issue 7
Show Author Affiliations
Paul B. Mirkarimi, Lawrence Livermore National Lab. (United States)

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