Share Email Print

Optical Engineering

Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure
Author(s): Eli Yablonovitch; Rutger B. Vrijen
Format Member Price Non-Member Price
PDF $20.00 $25.00

Paper Details

Date Published: 1 February 1999
PDF: 5 pages
Opt. Eng. 38(2) doi: 10.1117/1.602092
Published in: Optical Engineering Volume 38, Issue 2
Show Author Affiliations
Eli Yablonovitch, Univ. of California/Los Angeles (United States)
Rutger B. Vrijen, Univ. of California/Los Angeles (United States)

© SPIE. Terms of Use
Back to Top