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Optical Engineering

Optical projection lithography at half the Rayleigh resolution limit by two-photon exposure
Author(s): Eli Yablonovitch; Rutger B. Vrijen
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Paper Details

Date Published: 1 February 1999
PDF: 5 pages
Opt. Eng. 38(2) doi: 10.1117/1.602092
Published in: Optical Engineering Volume 38, Issue 2
Show Author Affiliations
Eli Yablonovitch, Univ. of California/Los Angeles (United States)
Rutger B. Vrijen, Univ. of California/Los Angeles (United States)


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