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Optical Engineering

Etching selectivity control during resist pattern transfer into silica for the fabrication of microlenses with reduced spherical aberrations
Author(s): Marco Severi; Patrick Louis Mottier
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Paper Details

Date Published: 1 January 1999
PDF: 5 pages
Opt. Eng. 38(1) doi: 10.1117/1.602069
Published in: Optical Engineering Volume 38, Issue 1
Show Author Affiliations
Marco Severi, CEA-LETI (France)
Patrick Louis Mottier, CEA-LETI (France)


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