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Optical Engineering

Influence of nonuniform pupils in imaging periodical structures by photolithographic systems
Author(s): Rosemarie Hild; Maria Josefa Yzuel; Juan C. Escalera; Juan Campos
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Paper Abstract

We study nonuniform transmission filters to improve resolution and/or depth of focus (DOF) in lithography. To understand the behavior of these filters for periodic structures we study the changes produced by the defocus in the image of a five-bar test. We analyze the behavior of the system with different degrees of coherence. For partially coherent illumination, we use the apparent transfer function (ATF), which is defined by the contrast in the image of a cosine grating object of the corresponding spatial frequencies. We also compare the ATF for incoherent illumination with the optical transfer function (OTF).

Paper Details

Date Published: 1 April 1998
PDF: 11 pages
Opt. Eng. 37(4) doi: 10.1117/1.601969
Published in: Optical Engineering Volume 37, Issue 4
Show Author Affiliations
Rosemarie Hild, Friedrich-Schiller Univ. (Germany)
Maria Josefa Yzuel, Univ. Autonoma de Barcelona (Spain)
Juan C. Escalera, Autonomous Univ. of Barcelona (Spain)
Juan Campos, Universitad Autono de Barcelona (Spain)

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