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Optical Engineering

Micropatterned multilayer dielectric filters with two spectral characteristics
Author(s): Marcus Frank; Uwe B. Schallenberg; Norbert Kaiser
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Paper Abstract

Micropatterned interference filters are developed by dry etching of dielectric multilayer stacks. The application of reactive-ion etching (RIE) techniques combined with the use of an etchstop layer are shown to be quite effective in producing two-stage micropatterns with defined spectral properties. By using a MgF2 underlayer the etching of TiO2 and SiO2 layers is stopped exactly, which provides the possibility to develop large area patterns (>1×1 cm2) with feature sizes as small as 10 mm. The distortion of edge features is shown to be better than 1 ?m. A filter array was developed providing high-reflection and antireflection coatings within a period of 20 ?m.

Paper Details

Date Published: 1 April 1997
PDF: 5 pages
Opt. Eng. 36(4) doi: 10.1117/1.601241
Published in: Optical Engineering Volume 36, Issue 4
Show Author Affiliations
Marcus Frank, Fraunhofer Institution for Applied Optics and Precision Engineering (Germany)
Uwe B. Schallenberg, Fraunhofer Institution for Applied Optics and Precision Engineering (Germany)
Norbert Kaiser, Fraunhofer Institut fuer Angewandte Optik und Feinmechanik (Germany)

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