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Optical Engineering

Investigation of the absorption induced damage in ultraviolet dielectric thin films
Author(s): Eberhard Welsch; K. Ettrich; Holger Blaschke; Peter Thomsen-Schmidt; Dieter Schaefer; Norbert Kaiser
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Paper Abstract

The interaction of UV laser radiation with optical coatings is investigated by a pulsed two-probe-beam photothermal technique. UV laser damage resistance studies on LaF3/MgF2, Al2O3/SiO2 , HfO2/SiO2 multilayer stacks are performed at ? = 248 nm and t520 ns. By investigating the relationship of the number of high-low (HL) pairs and the substrate material, optical and thermal coating properties are shown to be responsible for UV single-shot laser damage. The damage threshold of selected samples is influenced by the deposition technique. The influence of the bandgap energy of typical UV thin film oxide materials on the damage is investigated. Furthermore, multishot damage measurements on LaF3/MgF2 high-reflection multilayer coatings reveal the accumulation of laser energy in the predamage range and lead to an increase in absorption.

Paper Details

Date Published: 1 February 1997
PDF: 11 pages
Opt. Eng. 36(2) doi: 10.1117/1.601222
Published in: Optical Engineering Volume 36, Issue 2
Show Author Affiliations
Eberhard Welsch, Friedrich-Schiller-Univ. Jena (Germany)
K. Ettrich, Friedrich-Schiller-Univ. Jena (Germany)
Holger Blaschke, Friedrich-Schiller-Univ. (Germany)
Peter Thomsen-Schmidt, Berline Institut for Optik GMBH (Germany)
Dieter Schaefer, Berliner Institut fuer Optik GmbH (Germany)
Norbert Kaiser, Fraunhofer Institution for Applied Optics and Precision Engineering (Germany)


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