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Optical Engineering

Selected applications of photothermal and photoluminescence heterodyne techniques for process control in silicon wafer manufacturing
Author(s): Andreas Ehlert; Michael Kerstan; Holger Lundt; Anton Huber; Dieter Helmreich; Hans-Dieter Geiler; Harald Karge; Matthias Wagner
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Paper Abstract

Two noncontact laser-based heterodyne techniques, photothermal heterodyne (PTH) and photoluminescence heterodyne (PLH), are introduced and applied to processing and quality control in silicon wafer manufacturing. The crystallographic characteristics of processinduced defects in silicon wafers are suitable for the application of PTH and PLH techniques, which are demonstrated on selected examples from different steps of silicon wafer production. Both PLH and PTH techniques meet the demand for nondestructive and on-line-suitable measurement in the semiconductor industry.

Paper Details

Date Published: 1 February 1997
PDF: 13 pages
Opt. Eng. 36(2) doi: 10.1117/1.601216
Published in: Optical Engineering Volume 36, Issue 2
Show Author Affiliations
Andreas Ehlert, Wacker Siltronic AG (Germany)
Michael Kerstan, Wacker Chemitronic GmbH (Germany)
Holger Lundt, Wacker-Chemitronic GmbH (Germany)
Anton Huber, Wacker Siltronic AG (Germany)
Dieter Helmreich, Wacker Siltronic AG (Germany)
Hans-Dieter Geiler, Jena Wave Engineering & Consulting (Germany)
Harald Karge, JenaWave Engineering & Consulting (Germany)
Matthias Wagner, JenaWave Engineering & Consulting (Germany)

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