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Optical Engineering

Photothermal characterization of optical thin film coatings
Author(s): Zhouling Wu; Marshall Thomsen; Pao-Kuang Kuo; Y. S. Lu; Christopher J. Stolz; Mark R. Kozlowski
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Paper Abstract

Photothermal techniques are widely used in thin film characterizations and are particularly useful in studying laser-induced damage in optical coatings. The specific applications include measuring weak absorption, characterizing thermal conductivity, detecting local defects, and monitoring laser-interaction dynamics and determining laser damage thresholds as well as thermal impedance at boundaries of multilayers. We take an overview of the principle of photothermal techniques, the various detection methods, and the progress made during the last decade in applying these techniques to optical thin films. The further potential and limitations of the techniques will also be discussed, with emphasis on in situ studies of laser interaction with thin films and local defects.

Paper Details

Date Published: 1 January 1997
PDF: 12 pages
Opt. Eng. 36(1) doi: 10.1117/1.601125
Published in: Optical Engineering Volume 36, Issue 1
Show Author Affiliations
Zhouling Wu, Eastern Michigan Univ. (United States)
Marshall Thomsen, Eastern Michigan Univ. (United States)
Pao-Kuang Kuo, Wayne State Univ. (United States)
Y. S. Lu, Wayne State Univ. (United States)
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Mark R. Kozlowski, Lawrence Livermore National Lab. (United States)


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