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Optical Engineering

Microlens array imaging system for photolithography
Author(s): Reinhard Voelkel; Hans Peter Herzig; Philippe Nussbaum; Rene Daendliker; William B. Hugle
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Paper Details

Date Published: 1 November 1996
PDF: 8 pages
Opt. Eng. 35(11) doi: 10.1117/1.601080
Published in: Optical Engineering Volume 35, Issue 11
Show Author Affiliations
Reinhard Voelkel, Univ. of Neuchatel (Switzerland)
Hans Peter Herzig, Univ. of Neuchatel (Switzerland)
Philippe Nussbaum, Univ. of Neuchatel (Switzerland)
Rene Daendliker, Univ. of Neuchatel (Switzerland)
William B. Hugle, Hugle Lithography Inc. (Switzerland)


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